We have designed shower head with flow control feature to regulate flow of precursor gases to reactor. Height of shower head can be varied as per required application. Please contact us for more details.
A shower head is a key component in Chemical Vapor Deposition (CVD) systems used for the deposition of thin films. In CVD, precursor gases are introduced into a reaction chamber where they react to form a solid thin film on a substrate.
The shower head is typically a perforated plate located at the top of the reaction chamber, which is used to introduce the precursor gases into the chamber. The gases are introduced through a series of small holes or nozzles in the shower head, which allows for a more uniform distribution of the gases across the substrate surface.
The design of the shower head is critical for achieving a uniform deposition of the thin film on the substrate. The size, shape, and placement of the nozzles can affect the gas flow pattern and concentration, which in turn can affect the thickness, composition, and uniformity of the deposited film.
